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Alena Sosnina
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Publications (1)
Proceedings Article | 10 January 2013 Paper
Atomic force microscopy for line edge roughness measurements
A. Sosnina, A. Rogozhin, A. Miakonkikh
Proceedings Volume 8700, 870010 (2013) https://doi.org/10.1117/12.2017529
KEYWORDS: Line edge roughness, Plasma, Atomic force microscopy, Ions, Plasma treatment, Ultraviolet radiation, Line width roughness, Scanning electron microscopy, Semiconducting wafers, Neon
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