Mr. Alexander Bean
at Landmark Measurement Solutions
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | November 17, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Semiconductors, Lithography, Reticles, Metrology, Error analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Reticles, Scanners, Error analysis, Photomasks, Extreme ultraviolet, Semiconducting wafers, Tolerancing, Data corrections, Overlay metrology

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