Dr. Alex Buxbaum
Solutions Manager at Carl Zeiss X-ray Microscopy Inc
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Metrology, Etching, Quartz, Dry etching, Chemistry, Chromium, Photomasks, Wet etching, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Metrology, Etching, Quartz, Ions, Chromium, Photomasks, Reactive ion etching, 193nm lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Sensors, Scanners, Microscopy, Atomic force microscopy, Precision measurement, 3D metrology, Photomasks, Critical dimension metrology, Edge roughness

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Calibration, Etching, Quartz, Profilometers, Photomasks, Phase measurement, Laser metrology, Laser optics, Phase shifts

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Deep ultraviolet, Manufacturing, Scanning electron microscopy, Photomasks, Image enhancement, Artificial intelligence, Optical proximity correction, Data conversion, Vestigial sideband modulation, Evolutionary algorithms

PROCEEDINGS ARTICLE | March 11, 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Calibration, Etching, Dry etching, Manufacturing, Chromium, Photoresist materials, Photomasks, Chlorine, Optics manufacturing, Plasma

Showing 5 of 11 publications
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