Dr. Alex Buxbaum
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Logic, Statistical analysis, Scanning electron microscopy, Tomography, Data acquisition, Shape analysis, Semiconducting wafers

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Metrology, Etching, Quartz, Ions, Chromium, Photomasks, Reactive ion etching, 193nm lithography, Resolution enhancement technologies

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Metrology, Etching, Quartz, Dry etching, Chemistry, Chromium, Photomasks, Wet etching, Semiconducting wafers, Phase shifts

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Calibration, Etching, Quartz, Profilometers, Photomasks, Phase measurement, Laser metrology, Laser optics, Phase shifts

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Sensors, Scanners, Microscopy, Atomic force microscopy, Precision measurement, 3D metrology, Photomasks, Critical dimension metrology, Edge roughness

Showing 5 of 12 publications
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