Dr. Alex I. Ershov
MTS Scientist at ASML-Cymer
SPIE Involvement:
Author
Publications (43)

Proceedings Article | 9 September 2019
Proc. SPIE. 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Extreme ultraviolet, High volume manufacturing

Proceedings Article | 10 May 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scanners, Reflectivity, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, EUV optics, Plasma, Tin

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Light sources, Laser energy, High power lasers, Amplifiers, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Pulsed laser operation, Plasma, Tin

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Light sources, Deep ultraviolet, Scanners, Hydrogen, Laser applications, Laser development, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Showing 5 of 43 publications
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