The laser marking method has obvious advantages over other available marking methods in speed, accuracy, and flexibility. Mask marking and beam deflection marking are typical methods, each having advantages and disadvantages. In the former, an opaque mask is directly imaged to create the desired mark. This method is practical and relatively fast, but most of the marking energy is blocked, losing efficiency. Additionally, this method requires a precise and bulky lens system. In the latter method, the focused beam is steered onto the sample, writing point by point. This technique has higher flexibility between marks, but it is slow, requires micro-movements, and accurate micro-motion parts are very expensive. We propose an innovative, holographic approach in laser marking. In the new system, a holographic projection system based on a digitally designed computer-generated hologram (CGH) is employed. This specially designed, fully transparent, phase only CGH modulates the high-power writing beam to create any desired image in the far field, where the beam etches a permanent mark of that image onto the designated silicon wafer substrate. Holographic marking combines the advantages of mask and beam deflection marking methods, such as high speed and stationary operation with minimal power loss, in a relatively simple and inexpensive setup. Also, since the holographic projection maintains its image quality after a certain distance, the setup is less prone to spatial alignment errors. We believe that the proposed technique will make significant contributions in the field of laser marking.