Alex Pate
Photolithography Process Engineer at SAMSUNG Austin Semiconductor LLC
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Semiconductors, Lithography, Defect detection, Manufacturing, Inspection, Transmission electron microscopy, Semiconductor manufacturing, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Reticles, Metrology, Cadmium, Scanners, Inspection, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Modeling, Metrology, Data modeling, Computing systems, Control systems, Time metrology, Process control, Semiconducting wafers, Overlay metrology

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