Alex Pate
Photolithography Process Engineer at SAMSUNG Austin Semiconductor LLC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Reticles, Metrology, Cadmium, Scanners, Inspection, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Modeling, Metrology, Data modeling, Computing systems, Control systems, Time metrology, Process control, Semiconducting wafers, Overlay metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top