Dr. Alex Salnik
Strategic Technology Supply Manager at KLA-Tencor
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Oxides, Diffraction, Scattering, Spectroscopy, Silicon, Inspection, Optical inspection, Microelectronics, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Wafer-level optics, Reticles, Metrology, Cadmium, Etching, Inspection, Photoresist materials, Finite element methods, Critical dimension metrology, Semiconducting wafers

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