Alexander S. Gray
Sales Rep/Ph.D. Candidate at n&k Technology Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Etching, Quartz, Chromium, Phase shifts, Reflectivity, Metrology, Scatterometry, Atomic force microscopy, Standards development, Time metrology

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Reflectivity, Scatterometry, Transmittance, Photomasks, Spectrophotometry, Metrology, Nondestructive evaluation, Lamps, Visible radiation, Light

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Transmittance, Reflectivity, Critical dimension metrology, Optical properties, Diffraction, Matrices, Scatterometry, Signal to noise ratio, Inspection, Photomasks

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Transmittance, Reflectivity, Scatterometry, Scatter measurement, Critical dimension metrology, Dispersion, Signal to noise ratio, Optical testing, Quartz, Photons

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Transmittance, Reflectivity, Critical dimension metrology, Photomasks, Optical testing, Polarization, Scatterometry, Optical properties, Chemical elements, Phase measurement

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Photomasks, Critical dimension metrology, Pellicles, Phase shifts, Nondestructive evaluation, Optical properties, Transmittance, Reflectometry, Manufacturing, Inspection

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top