Alexander S. Gray
Sales Rep/Ph.D. Candidate at n&k Technology Inc
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Metrology, Etching, Quartz, Reflectivity, Chromium, Atomic force microscopy, Scatterometry, Time metrology, Standards development, Phase shifts

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Visible radiation, Metrology, Lamps, Reflectivity, Nondestructive evaluation, Scatterometry, Transmittance, Photomasks, Spectrophotometry, Light

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Signal to noise ratio, Diffraction, Optical properties, Matrices, Inspection, Reflectivity, Scatterometry, Transmittance, Photomasks, Critical dimension metrology

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Signal to noise ratio, Dispersion, Quartz, Photons, Reflectivity, Optical testing, Scatterometry, Transmittance, Critical dimension metrology, Scatter measurement

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Polarization, Optical properties, Reflectivity, Optical testing, Scatterometry, Transmittance, Photomasks, Phase measurement, Critical dimension metrology, Chemical elements

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical properties, Manufacturing, Inspection, Nondestructive evaluation, Pellicles, Reflectometry, Transmittance, Photomasks, Critical dimension metrology, Phase shifts

Showing 5 of 7 publications
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