Dr. Alexander Huebel
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Metrology, Calibration, Error analysis, Image registration, Monte Carlo methods, Photomasks, Data corrections, Standards development, Precision calibration

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