Alexander Muehle
at Qoniac GmbH
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | 12 November 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Semiconducting wafers, Forward error correction, Sensors, Scanners, Optimization (mathematics), Control systems, Contamination, Optical lithography, Chemical mechanical planarization, Databases

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Metrology, Data modeling, Manufacturing, Computer simulations, Optical alignment, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Optical lithography, Contamination, Sensors, Scanners, Data acquisition, Optimization (mathematics), Semiconducting wafers

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