Dr. Alexander Philippou
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Cadmium, Data modeling, Calibration, Photons, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | May 20, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Wafer-level optics, Ellipsometry, Lithography, Diffraction, Etching, Signal processing, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Signal detection

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