Dr. Alexander Serebryakov
PhD Student at ASML Netherlands BV
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Metrology, Optical lithography, Diffractive optical elements, Cadmium, Databases, Scanners, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | October 1, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Visualization, Metals, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Semiconductors, Lithography, Scanners, Data acquisition, Laser scanners, Microelectronics, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Reticles, Data modeling, Imaging systems, Calibration, Scanners, Manufacturing, Finite element methods, Critical dimension metrology, Optics manufacturing

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Lithographic illumination, Metals, Scanners, Printing, Photomasks, Optical proximity correction, High volume manufacturing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Reticles, Metals, Image processing, Manufacturing, Electroluminescence, Optical proximity correction, Critical dimension metrology, Photoresist processing, Tolerancing

Showing 5 of 14 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top