Dr. Alexander Serebryakov
PhD Student at ASML Netherlands BV
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Metrology, Optical lithography, Diffractive optical elements, Cadmium, Databases, Scanners, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

Proceedings Article | 1 October 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Visualization, Metals, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Semiconductors, Lithography, Scanners, Data acquisition, Laser scanners, Microelectronics, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Reticles, Data modeling, Imaging systems, Calibration, Scanners, Manufacturing, Finite element methods, Critical dimension metrology, Optics manufacturing

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Lithographic illumination, Metals, Scanners, Printing, Photomasks, Optical proximity correction, High volume manufacturing, Semiconducting wafers, Overlay metrology

Showing 5 of 14 publications
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