Mr. Alexander Tritchkov
Staff Process/CAD Engineer at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (37)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Genetic algorithms, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Photomasks, Source mask optimization

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Photonic devices, Optical lithography, Waveguides, Etching, Manufacturing, Photomasks, Photonic integrated circuits, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 3, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Metals, Image processing, Manufacturing, Data processing, Process control, Photomasks, Cadmium sulfide, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Defect detection, Visualization, Ions, Distance measurement, Photomasks, Computational lithography, Optical proximity correction, Critical dimension metrology, Bromine

Showing 5 of 37 publications
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