Alexander Tritchkov
Staff Process/CAD Engineer at Mentor a Siemens Business
SPIE Involvement:
Author
Publications (40)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF

Proceedings Article | 22 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Image processing, Manufacturing, Printing, Image quality, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Vestigial sideband modulation

SPIE Journal Paper | 31 July 2018
JM3 Vol. 18 Issue 01
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Photomasks, Source mask optimization

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Genetic algorithms, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

Showing 5 of 40 publications
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