Alexander Tritchkov
Staff Process/CAD Engineer at Mentor a Siemens Business
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Publications (39)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Image processing, Manufacturing, Inspection, Image quality, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Photomasks, Source mask optimization

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Genetic algorithms, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Photonic devices, Optical lithography, Waveguides, Etching, Manufacturing, Photomasks, Photonic integrated circuits, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 39 publications
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