Alexander C. Wei
Application Engineer at Siemens
SPIE Involvement:
Publications (22)

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 1095712 (2019)
KEYWORDS: SRAF, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Lithography

Proceedings Article | 22 October 2018 Presentation + Paper
Proceedings Volume 10810, 108100P (2018)
KEYWORDS: Photomasks, SRAF, Printing, Lithography, Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, Manufacturing, Image quality, Image processing

Proceedings Article | 28 March 2018 Presentation + Paper
Proceedings Volume 10588, 105880K (2018)
KEYWORDS: Optical proximity correction, Failure analysis, Semiconducting wafers, Calibration, Data modeling, Photomasks, Inspection, Optics manufacturing, Bridges, Finite element methods

Proceedings Article | 5 October 2016 Paper
Jingyu Wang, Alexander Wei, William Wilkinson, Norman Chen
Proceedings Volume 9985, 998528 (2016)
KEYWORDS: Optical proximity correction, Optical lithography, Semiconducting wafers, Wafer-level optics, Image segmentation, Photomasks, Lithography, Edge roughness, Image resolution, Imaging systems

Proceedings Article | 4 September 2015 Paper
Jingyu Wang, Alexander Wei, Piyush Verma, William Wilkinson
Proceedings Volume 9661, 96610D (2015)
KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Solids, Lithography, Diffraction, Wafer-level optics, Image segmentation, Imaging systems, Signal processing

Showing 5 of 22 publications
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