Dr. Alexander C. Wei
Application Engineer at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, SRAF

Proceedings Article | 22 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Image processing, Manufacturing, Printing, Image quality, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 28 March 2018 Presentation + Paper
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Data modeling, Calibration, Inspection, Finite element methods, Bridges, Photomasks, Optical proximity correction, Semiconducting wafers, Failure analysis, Optics manufacturing

Proceedings Article | 5 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Imaging systems, Image segmentation, Image resolution, Photomasks, Optical proximity correction, Semiconducting wafers, Edge roughness

Proceedings Article | 4 September 2015 Paper
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Diffraction, Imaging systems, Image segmentation, Signal processing, Solids, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 22 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top