Dr. Alexandra Grandpierre
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Reticles, Deep ultraviolet, Image processing, Ions, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers, Laser sintering

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Coating, Process control, Absorbance, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Phase shifts, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Reticles, Metrology, Coating, Manufacturing, Time metrology, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Reticles, Ultraviolet radiation, Coating, Doping, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Temperature metrology, Bottom antireflective coatings

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Statistical analysis, Etching, Error analysis, Diffusion, Coating, Manufacturing, Photoresist processing, Semiconducting wafers, Overlay metrology

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