Alexandre Villaret
at STMicroelectronics
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Liquid phase epitaxy, Visualization, Manufacturing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Wafer-level optics, Data modeling, Sensors, Scanners, Silicon, Finite element methods, Photomasks, Convolution, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Photovoltaics, Liquid phase epitaxy, Manufacturing, Printing, Bridges, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Manufacturing, Inspection, Design for manufacturing, Photomasks, Computational lithography, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical imaging, Optical lithography, Databases, Computer simulations, Photomasks, Optical simulations, Optical proximity correction, Critical dimension metrology, Process modeling, Current controlled current source

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Logic, Scanning electron microscopy, Bridges, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top