Dr. Ali A. Afzali-Ardakani
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Contamination, Deep ultraviolet, Photons, Hydrogen, Quantum efficiency, Photoresist materials, Image quality, Iodine, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top