Dr. Ali Bouaricha
at D2S Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 7 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020

Proceedings Article | 31 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 25 March 2020 Presentation
Proc. SPIE. 11327, Optical Microlithography XXXIII

Proceedings Article | 3 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Semiconductors, Semiconductors, Lithography, Lithography, Manufacturing, Manufacturing, Physics, Physics, Photomasks, Extreme ultraviolet, Extreme ultraviolet, Semiconductor manufacturing, Semiconductor manufacturing, Optical proximity correction, Optical proximity correction, Semiconducting wafers, Semiconducting wafers, Vestigial sideband modulation, Vestigial sideband modulation

Proceedings Article | 31 October 2017 Presentation + Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Point spread functions, Data modeling, Scattering, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Raster graphics, Electro optical modeling, Process modeling, Vestigial sideband modulation

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top