Dr. Ali Mokhberi
at
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Wafer-level optics, Reticles, Optical lithography, Inspection, Optical inspection, Wafer inspection, Directed self assembly, Epitaxy, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Semiconductors, Lithography, Calibration, Metals, Ultraviolet radiation, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Calibration, Metals, Ultraviolet radiation, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Scattering, Calibration, 3D modeling, 3D metrology, Photomasks, Optical proximity correction, Semiconducting wafers, 3D image processing

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Printing, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers, Systems modeling, Model-based design, Resolution enhancement technologies, Alternate lighting of surfaces

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Lithographic illumination, Electroluminescence, Printing, Photomasks, SRAF, Critical dimension metrology, Optimization (mathematics), Systems modeling, Model-based design

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top