Dr. Ali Mokhberi
SPIE Involvement:
Publications (8)

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 86811A (2013) https://doi.org/10.1117/12.2011177
KEYWORDS: Inspection, Semiconducting wafers, Wafer inspection, Reticles, Wafer-level optics, Epitaxy, Optical inspection, Defect inspection, Optical lithography, Directed self assembly

Proceedings Article | 1 April 2013 Paper
Gökhan Perçin, Huixiong Dai, Hsu-Ting Huang, Anwei Liu, Ali Mokhberi, Xin Zheng, Chris Ngai
Proceedings Volume 8679, 86790X (2013) https://doi.org/10.1117/12.2011666
KEYWORDS: Photomasks, Calibration, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Extreme ultraviolet, Ultraviolet radiation, Metals, High volume manufacturing, Semiconductors

Proceedings Article | 23 March 2012 Paper
Hsu-Ting Huang, Huixiong Dai, Ali Mokhberi, Xumou Xu, Anwei Liu, Chris Ngai
Proceedings Volume 8322, 83221K (2012) https://doi.org/10.1117/12.916502
KEYWORDS: Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Finite element methods, Metals, Ultraviolet radiation, Back end of line

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79732R (2011) https://doi.org/10.1117/12.879841
KEYWORDS: 3D modeling, Optical proximity correction, Photomasks, 3D metrology, Semiconducting wafers, Calibration, Lithography, Scattering, Optical lithography, 3D image processing

Proceedings Article | 23 September 2009 Paper
Bayram Yenikaya, Oleg Alexandrov, Yongjun Kwon, Anwei Liu, Ali Mokhberi, Apo Sezginer
Proceedings Volume 7488, 748815 (2009) https://doi.org/10.1117/12.829938
KEYWORDS: SRAF, Photomasks, Model-based design, Optimization (mathematics), Printing, Semiconducting wafers, Systems modeling, Resolution enhancement technologies, Optical proximity correction, Alternate lighting of surfaces

Showing 5 of 8 publications
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