Dr. Ali Mokhberi
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Wafer-level optics, Reticles, Optical lithography, Inspection, Optical inspection, Wafer inspection, Directed self assembly, Epitaxy, Semiconducting wafers, Defect inspection

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Semiconductors, Lithography, Calibration, Metals, Ultraviolet radiation, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Calibration, Metals, Ultraviolet radiation, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Back end of line

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Scattering, Calibration, 3D modeling, 3D metrology, Photomasks, Optical proximity correction, Semiconducting wafers, 3D image processing

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Printing, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers, Systems modeling, Model-based design, Resolution enhancement technologies, Alternate lighting of surfaces

Showing 5 of 8 publications
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