We investigate the depth of field (DoF) enhancing capacity of binary annular phase masks embedded in panchromatic imaging systems. We first demonstrate with numerical simulations and real-world imaging experiments that phase masks optimized for monochromatic illumination are somewhat robust to their use under wide spectrum illumination: they provide images that are slightly less sharp but less affected by deconvolution artifacts due to spectral averaging. Then, we show that masks specifically optimized for wide spectrum illumination perform better under this type of illumination than monochromatically optimized phase masks under monochromatic illumination, especially when the targeted DoF range is large. This interesting effect comes from the fact that deconvolution artifacts are significantly reduced by wide spectrum illumination. These results show that it is useful to take into account the illumination spectrum together with the scene characteristics and the targeted DoF range for effective co-design of DoF enhancing imaging systems.
We investigate the practical behavior of a co-optimized hybrid system involving a generic binary phase mask and digital deconvolution. We perform experiments with a case-study optical system with observed scene lighting by LED of different colors. By imaging a real scene and a depth of field (DoF) target, we show that the DoF reachable in practice matches with good accuracy the one predicted by simulation in case of monochromatic illumination. We also characterize the drop in performance when using this type of system with actual illumination wavelength departing from the nominal one.
We experimentally investigate the performance of co-optimized hybrid optical–digital imaging systems based on binary phase masks and digital deconvolution for extended depth-of-field (DoF) under narrow-band illumination hypothesis. These systems are numerically optimized by assuming a simple generic imaging model. Using images of DoF targets and real scenes, we experimentally demonstrate that in practice, they actually reach the DoF range for which they have been optimized. Moreover, they are shown to be robust against small mask manufacturing errors and residual spherical aberration in the optical system. These results demonstrate that the optical/digital optimization protocol based on generic imaging model can be safely used to design DoF-enhanced imaging systems aimed at real-world applications.
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