Alin O. Antohe
SiPh Integration Engineer
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 6 April 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Silica, Manufacturing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Ruthenium, Standards development

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Multilayers, Silica, Ions, Inspection, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Failure analysis, Ruthenium

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Titanium dioxide, Nickel, Silicon, Chemistry, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Ruthenium

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Particles, Ions, Reflectivity, Dielectrophoresis, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Yield improvement

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Thin films, Particles, Inspection, Dielectrophoresis, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Failure analysis, Defect inspection

Showing 5 of 20 publications
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