Allan X. Gu
at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Wafer-level optics, Logic, Optical lithography, Image processing, Neural networks, Photomasks, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Performance modeling

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Semiconductors, Lithography, Detection and tracking algorithms, Metals, Chromium, Photomasks, Optical proximity correction, Computer aided design, Neodymium, Semiconducting wafers

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