Dr. Allen H. Gabor
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Conference Program Committee | Author
Publications (42)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940S (2023) https://doi.org/10.1117/12.2661339
KEYWORDS: Monte Carlo methods, Extreme ultraviolet lithography, Scanners, Deep ultraviolet, Design and modelling, Semiconducting wafers, Overlay metrology, Photomasks, Extreme ultraviolet, Error analysis

SPIE Journal Paper | 8 November 2022 Open Access
JM3, Vol. 21, Issue 04, 041604, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041604
KEYWORDS: Reactive ion etching, Neural networks, Surface plasmons, Semiconducting wafers, Optical lithography, Data modeling, Stochastic processes, Etching, Data processing, Chaos

Proceedings Article | 13 June 2022 Presentation
Romain Lallement, Jaime Morillo, Daniel Schmidt, Rick Johnson, Cody Murray, Martin Burkhardt, Allen Gabor
Proceedings Volume PC12051, PC120510R (2022) https://doi.org/10.1117/12.2614278
KEYWORDS: Monte Carlo methods, Scanners, Extreme ultraviolet lithography, Overlay metrology, Semiconducting wafers, Photomasks, Optical lithography, Manufacturing, Lithography, Extreme ultraviolet

Proceedings Article | 26 May 2022 Paper
Proceedings Volume 12053, 120531W (2022) https://doi.org/10.1117/12.2613785
KEYWORDS: Overlay metrology, Optical simulations, Calibration, Optical lithography, Optical filters, Metrology, Photomasks, Semiconductors, Semiconducting wafers, Data modeling

Proceedings Article | 9 March 2021 Presentation + Paper
Proceedings Volume 11609, 1160907 (2021) https://doi.org/10.1117/12.2581823
KEYWORDS: Printing

Showing 5 of 42 publications
Conference Committee Involvement (8)
Optical and EUV Nanolithography XXXVIII
23 February 2025 | San Jose, California, United States
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Showing 5 of 8 Conference Committees
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