Mr. Allyn Jackson
Technical Support and FAE Manager at CyberOptics Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Sensors, Scanners, Particles, Inspection, Photomasks, Semiconducting wafers, Atmospheric particles, Environmental sensing, Contamination control

PROCEEDINGS ARTICLE | September 16, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Reticles, Sensors, Scanners, Particles, Inspection, Photomasks, Semiconducting wafers, Atmospheric particles, Environmental sensing, Contamination control

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