Dr. Alok Ranjan
Director at Tokyo Electron Miyagi Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: 3D applications, Etching, Germanium, Interfaces, Silicon, Plasmas, Transistors, Isotropic etching, Nanowires

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Lithography, Optical lithography, Etching, Ions, Silicon, Chemistry, Monte Carlo methods, Photomasks, Plasma etching, Plasma

Proceedings Article | 20 March 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Oxides, Etching, Ions, Silicon, Hydrogen, Ion beams, Fluorine, Plasma

Proceedings Article | 20 March 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Oxides, Etching, Dry etching, Plasmas, Oxygen, Plasma treatment

Proceedings Article | 21 March 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Optical lithography, Etching, Image processing, Interfaces, Ions, 3D modeling, Monte Carlo methods, Plasma etching, Chemical elements, Semiconducting wafers, Bromine, Process modeling, Plasma

Proceedings Article | 23 March 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Lithography, Optical lithography, Etching, Ions, Chemistry, Materials processing, Extreme ultraviolet, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Plasma

Showing 5 of 9 publications
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