Ms. Amandine Jouve
PhD Student at CEA-LETI
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Electron beam lithography, Polymers, Capillaries, Interfaces, Extreme ultraviolet, Extreme ultraviolet lithography, Adhesives, Liquids, Chemically amplified resists

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Thin films, Lithography, Electron beam lithography, Etching, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Liquids

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