Amandine Pikon
at Rohm and Haas Electronic Materials SAS
SPIE Involvement:
Publications (6)

Proceedings Article | 11 December 2009 Paper
Young Bae, Yi Liu, Thomas Cardolaccia, Ken Spizuoco, Rosemary Bell, Lori Joesten, Amandine Pikon, Michael Reilly, Sheri Ablaza, Peter Trefonas, George Barclay
Proceedings Volume 7520, 75201G (2009)
KEYWORDS: Double patterning technology, Optical lithography, Photoresist processing, Image processing, Lithography, Semiconducting wafers, Chemical reactions, Coating, Control systems, Liquids

Proceedings Article | 1 April 2009 Paper
Young Bae, Yi Liu, Thomas Cardolaccia, John McDermott, Peter Trefonas, Ken Spizuoco, Michael Reilly, Amandine Pikon, Lori Joesten, Gary Zhang, George Barclay, Julia Simon, Stéphanie Gaurigan
Proceedings Volume 7273, 727306 (2009)
KEYWORDS: Double patterning technology, Photoresist processing, Image processing, Semiconducting wafers, Lithography, Photoresist materials, Cadmium, Metrology, Electron beam lithography, Coating

Proceedings Article | 4 April 2008 Paper
H. Ridaoui, S. Derrough, C. Sourd, H. Trouve, A. Pikon, J. H. Tortai
Proceedings Volume 6923, 692326 (2008)
KEYWORDS: Ultraviolet radiation, Thin films, Lithography, Ellipsometry, Temperature metrology, Lamps, Time metrology, Optical properties, Xenon, Polymers

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69231D (2008)
KEYWORDS: Ions, Boron, Atomic force microscopy, Semiconducting wafers, Scanning electron microscopy, Fourier transforms, Silicon, Critical dimension metrology, Lithography, Monte Carlo methods

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181Q (2007)
KEYWORDS: Line edge roughness, Atomic force microscopy, Line width roughness, Scanning electron microscopy, Critical dimension metrology, Diffusion, Photoresist materials, Lithography, 3D modeling, Etching

Showing 5 of 6 publications
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