Amandine Pikon
at Rohm and Haas Electronic Materials SAS
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Image processing, Coating, Control systems, Double patterning technology, Chemical reactions, Photoresist processing, Semiconducting wafers, Liquids

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Cadmium, Image processing, Coating, Photoresist materials, Double patterning technology, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Thin films, Ellipsometry, Lithography, Optical properties, Polymers, Ultraviolet radiation, Lamps, Xenon, Time metrology, Temperature metrology

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Ions, Silicon, Fourier transforms, Atomic force microscopy, Scanning electron microscopy, Monte Carlo methods, Boron, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Etching, Diffusion, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Line width roughness, Critical dimension metrology, Line edge roughness

Showing 5 of 6 publications
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