Ami Berger
Product Specialist at Applied Materials
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Silicon, Scanning electron microscopy, Line width roughness, Double patterning technology, Neodymium, Semiconducting wafers

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Etching, Scanning electron microscopy, Process control, Line width roughness, Double patterning technology, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

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