Amir Borna
at Univ of Michigan
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Cadmium, Image processing, Silicon, Photomasks, Transistors, Optical proximity correction, Computer aided design, Critical dimension metrology, Device simulation

PROCEEDINGS ARTICLE | May 3, 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Statistical analysis, Error analysis, Manufacturing, Monte Carlo methods, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Device simulation

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