Dr. Amir Sagiv
at Applied Materials
SPIE Involvement:
Publications (13)

SPIE Journal Paper | 1 October 2011
Christopher Bencher, Jo Finders, Ilan Englard, Yaron Cohen, Amir Sagiv, Michael Ben-Yishai, Shmoolik Mangan, Huixiong Dai, Chris Ngai, Kfir Dotan, Roel Knops, Orion Mouraille, Evert Mos, Alexander Kremer
JM3, Vol. 10, Issue 04, 043003, (October 2011) https://doi.org/10.1117/12.10.1117/1.3641409
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Lithography, Metrology, Inspection, Scanners, Optimization (mathematics), Double patterning technology, Wavefronts

Proceedings Article | 20 April 2011 Paper
Yaron Cohen, Jo Finders, Roel Knops, Orion Mouraille, Ingrid Minnaert-Janssen, Frank Duray, Evert Mos, Alexander Kremer, Amir Sagiv, Shmoolik Mangan, Michael Ben Yishay, Huixiong Dai, Christopher Bencher, Christopher Ngai, Kfir Dotan, Ilan Englard
Proceedings Volume 7971, 79711N (2011) https://doi.org/10.1117/12.881657
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Lithography, Critical dimension metrology, Scanners, Inspection, Double patterning technology, Optimization (mathematics), Wavefronts

Proceedings Article | 26 May 2010 Paper
Amir Sagiv, Aviram Tam, Wolf Staud, Linyong Pang, Danping Peng, Lin He, Dongxue Chen, Thuc Dam, Vikram Tolani
Proceedings Volume 7748, 77480P (2010) https://doi.org/10.1117/12.868053
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Image restoration, Image resolution, Airborne remote sensing, Scanners, Lithography, Defect inspection, Imaging systems

Proceedings Article | 20 April 2010 Paper
T. Verdene, A. Sagiv, U. Malul, T. Alumot, S. Mangan
Proceedings Volume 7638, 76383T (2010) https://doi.org/10.1117/12.858638
KEYWORDS: Signal detection, Polarization, Photomasks, Extreme ultraviolet, Inspection, Defect detection, Deep ultraviolet, Lithographic illumination, Lithography, Extreme ultraviolet lithography

Proceedings Article | 2 April 2010 Paper
Amir Sagiv, Jo Finders, Robert Kazinczi, Andre Engelen, Frank Duray, Ingrid Minnaert-Janssen, Shmoolik Mangan, Dror Kasimov, Ilan Englard
Proceedings Volume 7638, 763830 (2010) https://doi.org/10.1117/12.848376
KEYWORDS: Source mask optimization, Photomasks, Lithography, Semiconducting wafers, Airborne remote sensing, Cadmium, Inspection, Critical dimension metrology, Metrology, Finite element methods

Showing 5 of 13 publications
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