Dr. Amir Sagiv
at Applied Materials
SPIE Involvement:
Author
Publications (13)

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Lithography, Metrology, Inspection, Scanners, Optimization (mathematics), Double patterning technology, Wavefronts

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Scanners, Inspection, Wavefronts, Photomasks, Double patterning technology, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 26 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Imaging systems, Scanners, Inspection, Image restoration, Image resolution, Photomasks, Semiconducting wafers, Airborne remote sensing, Defect inspection

Proceedings Article | 20 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Lithographic illumination, Defect detection, Deep ultraviolet, Polarization, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Cadmium, Inspection, Finite element methods, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Showing 5 of 13 publications
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