Amit Zakay
at Applied Materials Israel, Ltd.
SPIE Involvement:
Publications (3)

SPIE Journal Paper | 4 November 2022
JM3, Vol. 21, Issue 04, 041605, (November 2022)
KEYWORDS: Etching, System on a chip, Image processing, Sensors, Lithography, Semiconducting wafers, Distance measurement, Process control, Transistors, Signal to noise ratio

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530D (2022)
KEYWORDS: Overlay metrology, Double patterning technology, Edge roughness, Scanning electron microscopy, Manufacturing, Line width roughness, Line edge roughness, Integrated circuits, Electron microscopy, Critical dimension metrology

Proceedings Article | 26 May 2022 Presentation + Paper
Gaetano Santoro, Kevin Houchens, Janusz Bogdanowicz, Moshe Elizov, Lior Yaron, Michael Chemama, Alex Goldenshtein, Amit Zakay, Noam Amit, Basoene Briggs, Antoine Pacco, Romain Delhougne, Andrew Cockburn, Yaniv Abramovitz, Aviram Tam, Ofer Adan, Hans Mertens, Anne-Laure Charley, Naoto Horiguchi, Philippe Leray, Gian Francesco Lorusso
Proceedings Volume 12053, 120530L (2022)
KEYWORDS: Transmission electron microscopy, Metrology, Scanning electron microscopy, Metals, 3D metrology, Molybdenum, Tin, Semiconducting wafers, Signal to noise ratio, Process control

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