Dr. Amr Y. Abdo
Senior Member of Technical Staff at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (32)

PROCEEDINGS ARTICLE | October 23, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Optical lithography, Data modeling, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Performance modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Mathematical modeling, Metrology, Surface plasmons, Optical lithography, Data modeling, Calibration, Optical proximity correction, Semiconducting wafers, Integrated circuit design, Statistical modeling

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Surface plasmons, Optical lithography, Data modeling, Calibration, Image processing, Printing, Image quality, Optical proximity correction, Statistical modeling, Process modeling

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Data modeling, Calibration, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling, Process modeling

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Optical lithography, Data modeling, Etching, 3D modeling, Scanning electron microscopy, Printing, Critical dimension metrology, Semiconducting wafers, Process modeling, 3D image processing

PROCEEDINGS ARTICLE | March 13, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photoresist materials, Photomasks, Critical dimension metrology, Statistical modeling, 3D image processing

Showing 5 of 32 publications
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