Dr. Amy E. Zweber
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photomasks, Line edge roughness, Electron beam lithography, Electrons, SRAF, Extreme ultraviolet, Image resolution, EUV optics, Inspection, Manufacturing

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Phase shifts, Logic, Lithography, Chromium, Inspection, Opacity, SRAF, Etching, Attenuators

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Etching, Opacity, Switching, SRAF, Dry etching, Critical dimension metrology, Logic, Scanning electron microscopy, Manufacturing, Image resolution

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Data modeling, Logic, Chromium, Lithography, SRAF, Metrology, Immersion lithography

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Switching, Chromium, Switches, Silicon, Ultraviolet radiation, Lamps, Optical microscopes

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Photomasks, Line edge roughness, Semiconducting wafers, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Lithographic illumination, Photoresist materials, Linear filtering

Showing 5 of 19 publications
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