Dr. Amy E. Zweber
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 4 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electrons, Manufacturing, Inspection, Image resolution, Photomasks, Extreme ultraviolet, SRAF, Line edge roughness, EUV optics

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Switching, Opacity, Etching, Dry etching, Manufacturing, Image resolution, Scanning electron microscopy, SRAF, Critical dimension metrology

Proceedings Article | 1 October 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Metrology, Logic, Data modeling, Chromium, Photomasks, Immersion lithography, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical microscopes, Switches, Switching, Ultraviolet radiation, Silicon, Lamps, Inspection, Chromium, Photomasks, Semiconducting wafers

Showing 5 of 19 publications
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