An-Shun Liu
at Industrial Technology Research Institute
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Optical imaging, Optical design, Metrology, Detection and tracking algorithms, Error analysis, Silicon, Image analysis, Image sensors, Algorithm development, Overlay metrology

SPIE Journal Paper | 1 December 2006
OE Vol. 45 Issue 12
KEYWORDS: Critical dimension metrology, Data modeling, Optical engineering, Detection and tracking algorithms, Systems modeling, Semiconducting wafers, Overlay metrology, Metrology, Image quality, Imaging systems

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Optical imaging, Metrology, Detection and tracking algorithms, Data modeling, Silicon, Optical metrology, Image sensors, Dimensional metrology, Objectives, Critical dimension metrology

Proceedings Article | 10 September 2005
Proc. SPIE. 5908, Optical Information Systems III
KEYWORDS: Optical filters, Optical design, Metrology, Detection and tracking algorithms, Objectives, Charge-coupled devices, Computer aided design, Critical dimension metrology, Algorithm development, Overlay metrology

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Wafer-level optics, Optical design, Detection and tracking algorithms, Data modeling, Silicon, Process control, Semiconducting wafers, Wafer testing, Overlay metrology, Diffraction gratings

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top