Dr. Anat Marchelli
at KLA Israel
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 27 April 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Apodization, Metrology, Polarization, Laser scattering, Quality measurement, Scatterometry, Image quality, Laser metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Lenses, Time metrology, Distance measurement, Process control, Raster graphics, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Optical design, Metrology, Data modeling, Databases, Metals, Image segmentation, Signal processing, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 April 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Optical design, Metrology, Sensors, Spectroscopy, Scatterometry, Signal processing, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Metrology, Detection and tracking algorithms, Etching, Scanners, Silicon, Scatterometry, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

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