Dr. Anatol M. Schwersenz
Product Manager at Institut für Mikroelektronik Stuttgart
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Author
Publications (6)

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Coating, Photomasks, Beam shaping, Photoresist processing, Semiconducting wafers, Prototyping, Chemically amplified resists

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Etching, Quartz, Manufacturing, Chromium, Photomasks, Beam shaping, Nanoimprint lithography, Photoresist processing, Chemically amplified resists

Proceedings Article | 8 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Etching, Quartz, Manufacturing, Chromium, Printing, Photomasks, Nanoimprint lithography, Photoresist processing, Chemically amplified resists

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Etching, Diffusion, Coating, Scanning electron microscopy, Photomasks, Mask making, Line edge roughness, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Etching, Coating, Scanning electron microscopy, Mask making, Critical dimension metrology, Line edge roughness, Photoresist processing, Temperature metrology, Chemically amplified resists

Showing 5 of 6 publications
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