Dr. Anatoly Y. Bourov
at Shanghai Micro Electronics Equipment Co Ltd
Publications (45)

SPIE Journal Paper | June 11, 2013
OE Vol. 52 Issue 06
KEYWORDS: In situ metrology, Image processing, Principal component analysis, Process modeling, Lithography, Matrices, Optical engineering, Image retrieval, Lithographic illumination, Zernike polynomials

SPIE Journal Paper | May 7, 2013
OE Vol. 52 Issue 05
KEYWORDS: Photomasks, Lithography, Artificial intelligence, Principal component analysis, Optical engineering, Process modeling, Wavefront aberrations, Monochromatic aberrations, Instrument modeling, Mechanics

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Reticles, Scanners, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Overlay metrology, Phase shifts

PROCEEDINGS ARTICLE | December 18, 2012
Proc. SPIE. 8550, Optical Systems Design 2012
KEYWORDS: Lithography, Principal component analysis, Statistical analysis, Lithographic illumination, Imaging systems, Matrices, Image processing, Error analysis, Artificial intelligence, Process modeling

PROCEEDINGS ARTICLE | December 18, 2012
Proc. SPIE. 8550, Optical Systems Design 2012
KEYWORDS: Lithography, Metrology, Principal component analysis, Image processing, In situ metrology, Wavefront aberrations, Computer simulations, Photomasks, Artificial intelligence, Semiconducting wafers

SPIE Journal Paper | June 7, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Lithography, Principal component analysis, Sensors, Monochromatic aberrations, Wavefront aberrations, Image sensors, Semiconducting wafers, Image processing, Photomasks, Process modeling

Showing 5 of 45 publications
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