Dr. André Egbert
at Phoenix EUV Systems & Services GmbH
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Mirrors, Spectrographs, Metrology, Calibration, X-rays, Electrons, Silicon, Reflectometry, Solids, Extreme ultraviolet

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Mirrors, Electrodes, Scanners, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 21 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Mirrors, Spectrographs, Metrology, Calibration, X-rays, Electrons, Silicon, Reflectometry, Solids, Extreme ultraviolet

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Mirrors, Metrology, Calibration, X-rays, Electrons, Silicon, Reflectivity, Reflectometry, Solids, Extreme ultraviolet

Proceedings Article | 16 June 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Reflectivity, Magnetism, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Showing 5 of 23 publications
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