Dr. André Egbert
at Phoenix EUV Systems & Services GmbH
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 21 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Extreme ultraviolet, Silicon, Mirrors, Metrology, Reflectometry, Calibration, Electrons, X-rays, Solids, Spectrographs

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Xenon, Plasma, Tin, Electrodes, Photomasks, Scanners, Lithography, Mirrors

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Extreme ultraviolet, Silicon, Mirrors, Metrology, Reflectometry, Calibration, Electrons, X-rays, Solids, Spectrographs

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Extreme ultraviolet, Mirrors, Silicon, Metrology, Reflectometry, Calibration, Reflectivity, Solids, Electrons, X-rays

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Lithography, Metrology, Xenon, Photomasks, Tin, Reflectivity, Magnetism

Showing 5 of 23 publications
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