Andre Engelen
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Metrology, Sensors, Scanners, Control systems, Scatterometry, Signal processing, Semiconducting wafers, Yield improvement, Wafer manufacturing, Overlay metrology

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Scanners, Control systems, Process control, Shape analysis, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Instrument modeling, Fiber optic illuminators

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Mirrors, Reticles, Lithographic illumination, Diffractive optical elements, Manufacturing, Distortion, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Mirrors, Diffractive optical elements, Polarization, Imaging systems, Electroluminescence, Photomasks, Source mask optimization, Semiconducting wafers, Light, Fiber optic illuminators

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Mirrors, Metrology, Switching, Diffractive optical elements, Scanners, Micromirrors, Source mask optimization, Semiconducting wafers, Light, Fiber optic illuminators

Showing 5 of 21 publications
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