Andre Poock
Senior Process Engineer at GLOBALFOUNDRIES Dresden Module Two
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Metrology, Logic, Optical lithography, Oscillators, Etching, Scanners, Photomasks, Line width roughness, Transistors, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Reticles, Calibration, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Product engineering

PROCEEDINGS ARTICLE | November 16, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Reticles, Metrology, Defect detection, Inspection, Wafer inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Environmental sensing

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Defect detection, Inspection, Image resolution, Printing, Wafer inspection, Photomasks, Semiconducting wafers, Wafer testing, Defect inspection

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Visualization, Metals, Inspection, Image transmission, Wafer inspection, Photomasks, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Quartz, Air contamination, Particles, Ions, Inspection, Raman spectroscopy, Pellicles, Chemical analysis

Showing 5 of 7 publications
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