Dr. Andrea F. Wüest
Project Manager at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Polymers, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Polymer thin films, EUV optics

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Mirrors, Contamination, Titanium dioxide, Error analysis, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Ruthenium

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Lithography, Contamination, Inspection, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Contamination, Photons, Molecules, Electrons, Extreme ultraviolet lithography, Molecular interactions, Radiation effects, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Photons, Diffusion, Quantum efficiency, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Contamination, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 15 publications
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