Andreas Englisch
at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 9 April 2001
Proc. SPIE. 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Quartz, Electrodes, Dielectrics, Ions, Diagnostics, Physics, Photomasks, Aluminum, Semiconducting wafers

Proceedings Article | 30 December 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Semiconductors, Reticles, Deep ultraviolet, Sputter deposition, Glasses, Resistance, Reflectivity, Photomasks, Semiconducting wafers, Photomask technology

Proceedings Article | 1 June 1990
Proc. SPIE. 1261, Integrated Circuit Metrology, Inspection, and Process Control IV
KEYWORDS: Lithography, Reticles, Metrology, Databases, Manufacturing, Inspection, Process control, Microcontrollers, Integrated circuits, Tolerancing

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